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작성일 : 14-07-03 19:03
Fast electroless fabrication of uniform mesoporous silicon layers
 글쓴이 : 최고관리자
조회 : 773  

We reported that PaCE is capable of fabricating uni-form and meso-PSi. Etching rates of more than 1.7 μm/min have been obtained under optimized conditions. The obtained meso-PSi shows superior uniformity over the micro-PSi. Electrostatic simulation based on the metal–Si nano-Schottky contact can qualitatively explain the morphological difference of PSi in moderately and highly doped Si. Our work provides a facile, cost-effective route to fabricate various PSi structures, which can be easily scaled to wafer size. Since the etching area would be no longer constrained by electrochemical cell size, this technique can be directly applied to layer transfer technologies in photovoltaics or surface micromachining in microsystem technologies reducing process complexities and improving the yield. The Pt can be recycled after the process and in principle be reused.


 
   
 

 
 
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