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작성일 : 14-09-29 14:58
Single crystalline silicon thin film PV
 글쓴이 : 최고관리자
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 Crystalline Si photovoltaics benefits from more than half a century of experience in Si microelectronics. The photovoltaic material Si is abundant in the earth’s crust and is environmentally benign. The main obstacle for a wider spread of crystalline silicon photovoltaics is the high cost of crystalline Si wafers that have a typical thickness of 300μm and account for about 50% of the module costs. The reduction of the Si consumption is the driving force for the world-wide increasing interest in the development of thin film modules.

 To make the flexible thin film cells whose thickness is less than 30um, we focus on the stress-induced lift-off process. A special surface conditioning of the substrate permits the transfer of the device layer from a re-usable growth substrate to a low-cost device carrier. Using a monocrystalline Si wafer as the growth substrate permits to fabricate monocrystalline cells. Grain boundaries and their recombination losses are fully avoided. The cost of the Si substrate is not a problem if the substrate wafer is re-used frequently.

 


 
   
 

 
 
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